ASML ARF曝光机，二手翻新步进扫描光刻机PAS 5500-750C-青岛佳鼎分析仪器有限公司手机版

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PAS5500/750F DUV步进扫描系统使用成熟的248nmKrF技术，可以实现130nm的大规模生产。它结合了改进的0.7NA 4倍还原镜头的成像能力与调平系统中的多点创新，以及空中II照明技术，包括类星体、多极照明和可选的多重曝光能力。该系统配备了TTL对齐和ATHENA，以提高后端工艺层的对齐精度，配备了一个小于25nm的长期单机覆盖。

步进扫描光刻机PAS 5500-750C进一步减少开销时间，并结合提高客户作业的生产率，提供了130片/h晶圆(200毫米)的生产吞吐量。应用2kHz20WKrF激光器可以获得的操作成本。

ASML ARF曝光机，二手翻新步进扫描光刻机PAS 5500-750C

特点与优势：

Variable, 0.7 NA Deep UV Projection Lens

Production resolution down to 130 nm.

Step and Scan

Large field size, better CD control and lower lens aberrations.

AERIAL II Illumination with QUASAR and Optional Multiple Exposure Capability

Provides the ultimate flexibility in illumination modes at maximum throughput.

PAS 5500 Step-and-Scan Body

Commonality with i-line and 193-nm Step-and-Scan tools for economic mix-and-match.

8-Spot Level Sensor

Improved focus and leveling under production conditions.

ATHENA Advanced Alignment

Increased alignment accuracy process latitude.

Includes 2kHz 20W KrF Laser Technology with VariableLaser Frequency Control

The perfect combination of high laser power for high throughput and efficient use of laser pulses for

the lowest possible laser Cost of Operation.

ASML ARF曝光机，二手翻新步进扫描光刻机PAS 5500-750C

产品简介

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