硒化锗晶体(百分之99.995)GeSe
硒化锗晶体(百分之99.995)GeSe
硒化锗晶体(百分之99.995)GeSe
硒化锗晶体(百分之99.995)GeSe
硒化锗晶体(百分之99.995)GeSe

硒化锗晶体(百分之99.995)GeSe

参考价: 面议

具体成交价以合同协议为准
2022-06-05 10:40:03
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硒化锗晶体 GeSe (Germanium Selenide)
晶体尺寸:~10毫米
电学性能:半导体
晶体结构:斜方晶系
晶胞参数:a = 0.383 nm, b = 0.440 nm, c = 1.078 nm, α = β = γ = 90°
晶体类型:合成
晶体纯度:>99.995%

详细介绍

硒化锗晶体 GeSe (Germanium Selenide)
晶体尺寸:~10毫米
电学性能:半导体
晶体结构:斜方晶系
晶胞参数:a = 0.383 nm, b = 0.440 nm, c = 1.078 nm, α = β = γ = 90°
晶体类型:合成
晶体纯度:>99.995%

X-ray diffraction on a GeSe single crystal aligned along the (100) plane. XRD was performed at room temperature using a D8 Venture Bruker. The 4 XRD peaks correspond, from left to right, to (h00) with h = 2, 4, 6, 8

 

Powder X-ray diffraction (XRD) of a single crystal GeSe. X-ray diffraction was performed at room temperature using a D8 Venture Bruker.

 

Stoichiometric analysis of a single crystal GeSe by Energy-dispersive X-ray spectroscopy (EDX).

 

Raman spectrum of a single crystal GeSe. Measurement was performed with a 785 nm Raman system at room temperature.

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