二硫化铪晶体(百分之99.995) HfS2
二硫化铪晶体(百分之99.995) HfS2
二硫化铪晶体(百分之99.995) HfS2
二硫化铪晶体(百分之99.995) HfS2
二硫化铪晶体(百分之99.995) HfS2

二硫化铪晶体(百分之99.995) HfS2

参考价: 面议

具体成交价以合同协议为准
2022-06-05 10:40:03
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二硫化铪晶体 HfS2 (Hafnium Disulfide)
晶体尺寸:~10毫米
电学性能:半导体
晶体结构:六边形
晶胞参数:a = b = 0.363 nm, c = 0.586 nm, α = β = 90°, γ = 120°
晶体类型:合成
晶体纯度:>99.995%

详细介绍

二硫化铪晶体 HfS2 (Hafnium Disulfide)
晶体尺寸:~10毫米
电学性能:半导体
晶体结构:六边形
晶胞参数:a = b = 0.363 nm, c = 0.586 nm, α = β = 90°, γ = 120°
晶体类型:合成
晶体纯度:>99.995%

 

X-ray diffraction on a HfS2 single crystal aligned along the (001) plane. XRD was performed at room temperature using a D8 Venture Bruker. The 4 XRD peaks correspond, from left to right, to (00l) with l = 1, 2, 3, 4

 

Powder X-ray diffraction (XRD) of a single crystal HfS2. X-ray diffraction was performed at room temperature using a D8 Venture Bruker.

 

Stoichiometric analysis of a single crystal HfS2 by Energy-dispersive X-ray spectroscopy (EDX).

 

Raman spectrum of a single crystal HfS2. Measurement was performed with a 785 nm Raman system at room temperature.

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